Chemical Modification of Colloidal Masks for Nanolithography
نویسندگان
چکیده
منابع مشابه
Chemical modification of colloidal masks for nanolithography.
A method is presented to tune the holes in colloidal masks used for nanolithography. Using a simple wet-chemical method, a thin layer of silica is grown on masks of silica particles. The size of the holes is controlled by the amount of tetraethoxysilane (TEOS) added. More accurate tuning of the hole size is possible in the presence of a calibrated seed dispersion of silica colloids. We demonstr...
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The use of masks coming from research field as different as colloids, polymers or nanomaterials is a recently emerging field. Recent advances in this area have developed a variety of practical routes which have a great potential to overcome or at least complete the high-cost lithographic techniques. This review focuses on three techniques that try to reduce to the nanometer range, the size of t...
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A method is presented to control the in-plane ordering, size, and interparticle distance of nanoparticles fabricated by evaporation through a mask of colloidal particles. The use of optical tweezers combined with critical point drying gives single-particle position control over the colloidal particles in the mask. This extends the geometry of the colloidal masks from (self-organized) hexagonal ...
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Synthetic skills are the prerequisite and foundation for the modern chemical and pharmaceutical industry. The same is true for nanotechnology, whose development has been hindered by the sluggish advance of its synthetic toolbox, i.e., the emerging field of nanosynthesis. Unlike organic chemistry, where the variety of functional groups provides numerous handles for designing chemical selectivity...
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We have developed a direct mask modification method applicable in hole-mask nanostructure fabrication. It is demonstrated that by using this technique the size, material, relative location and ordering of individual subunits can be controlled and varied independently to generate hetero-assemblies of nanostructures including chiral structures over large areas.
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ژورنال
عنوان ژورنال: Langmuir
سال: 2008
ISSN: 0743-7463,1520-5827
DOI: 10.1021/la703847p